Intro to the Journal of Micro/Nanolithography, MEMS, and MOEMS from the Editor-in-Chief, Chris Mack

SPIE Journal of Micro/Nanolithography, MEMS, and MOEMS - http://spie.org/x865.xml The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes peer-reviewed papers on the development of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, micro-optoelectromechanical systems, and photonics industries. The scope is broad to facilitate synergy and interest between the communities served by the journal. Topical areas covered include: tools, processes, and materials associated with the lithography of structures that have submicrometer features; technologies to shape three-dimensional structures leading to the fabrication of active and passive electronic, electromechanical, optoelectronic, and opto-electro-mechanical devices, as well as passive optical devices; and core processes and technologies necessary for packaging and integration, with a focus on wafer-scale and other volume integration methods.